Usage Rates - Revision history

Tkimoto at 22:29, 21 April 2026

2026-04-21T22:29:17Z

← Older revision		Revision as of 22:29, 21 April 2026
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	==Full-Service Work Requests ==		==Full-Service Work Requests ==
	KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as ~~charges for~~ the following:		KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as the following. '''Note:''' The rates shown here are the direct costs for internal (Caltech/JPL) customers. Overhead fees will be applied.
	{\| class="wikitable"		{\| class="wikitable"
	\|Fees		\|Fees
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	'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.		'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

	'''~~Note~~:''' ~~The rates above are the direct costs. Overhead fees will be applied.~~		'''External Customers interested in full-service work: [[Full Service Rates\|see the information here]].'''

	==Overhead/Indirect Cost Rate ==		==Overhead/Indirect Cost Rate ==

Tkimoto: /* Caltech & JPL User Rates */

2026-04-02T20:19:45Z

Caltech & JPL User Rates

← Older revision		Revision as of 20:19, 2 April 2026
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" ~~System~~		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" - oxides and nitrides
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD ~~System~~ (legacy)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD (legacy) - amorphous Si
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr

Tkimoto: /* Caltech & JPL User Rates */

2026-04-02T20:18:18Z

Caltech & JPL User Rates

Tkimoto: /* Caltech & JPL User Rates */

2026-03-20T20:48:25Z

Caltech & JPL User Rates

← Older revision		Revision as of 20:48, 20 March 2026
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$75/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$75/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (~~TBA~~)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (available soon)
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System ~~(TBA)~~		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Microscopy, Focused Ion Beam (FIB)		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Microscopy, Focused Ion Beam (FIB)
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr

Tkimoto: /* Caltech & JPL User Rates */

2025-11-11T20:11:49Z

Caltech & JPL User Rates

← Older revision		Revision as of 20:11, 11 November 2025
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	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford FlexAl ALD/ALE System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford FlexAl ALD/ALE System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$50/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System

Tkimoto at 16:20, 24 October 2025

2025-10-24T16:20:09Z

← Older revision		Revision as of 16:20, 24 October 2025
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	\|Technical Staff Effort (hourly)		\|Technical Staff Effort (hourly)
	\|$ 100.00		\|$ 100.00
			\|-
			\|Equipment Hourly Use Fees (see pricing list above)
			\|$ varies
	\|-		\|-
	\|Administrative Fee (per transaction)		\|Administrative Fee (per transaction)

Tkimoto: /* Caltech & JPL User Rates */

2025-10-01T06:03:03Z

Caltech & JPL User Rates

← Older revision		Revision as of 06:03, 1 October 2025
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	==Caltech & JPL User Rates==		==Caltech & JPL User Rates==
	Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA ~~award~~ type. Rates are valid beginning October 1, 2025 and are subject to change.		Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

	{\| class="wikitable" style="width: 90%;"		{\| class="wikitable" style="width: 90%;"

Tkimoto: /* Caltech & JPL User Rates */

2025-10-01T06:01:59Z

Caltech & JPL User Rates

← Older revision		Revision as of 06:01, 1 October 2025
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	*Electron Beam Evaporators		*Electron Beam Evaporators
	*Laser Interference Lithography System		*Laser Interference Lithography System
			*He-Ne-Ga Ion Microscope (Orion Nanofab)
	*Mask Aligners		*Mask Aligners
	*Parylene Coater		*Parylene Coater

Tkimoto: /* Caltech & JPL User Rates */

2025-10-01T05:58:30Z

Caltech & JPL User Rates

← Older revision		Revision as of 05:58, 1 October 2025
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	==Caltech & JPL User Rates==		==Caltech & JPL User Rates==
	Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. ~~Discounted hourly rates are "unlocked" for hours that exceed the monthly usage thresholds listed below.~~ Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA award type~~. Lab invoices are issued on a monthly basis~~. Rates are valid beginning October 1, 2025 and are subject to change.		Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA award type. Rates are valid beginning October 1, 2025 and are subject to change.

	{\| class="wikitable" style="width: 90%;"		{\| class="wikitable" style="width: 90%;"

Tkimoto: /* Full-Service Work Requests */

2025-10-01T05:56:36Z

Full-Service Work Requests

← Older revision		Revision as of 05:56, 1 October 2025
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	\|$ 100.00		\|$ 100.00
	\|}		\|}
	'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to kni@caltech.edu. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.		'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

	'''Note:''' The rates above are the direct costs. Overhead fees will be applied.		'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

← Older revision		Revision as of 20:19, 2 April 2026
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" ~~System~~		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" - oxides and nitrides
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD ~~System~~ (legacy)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD (legacy) - amorphous Si
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr

← Older revision		Revision as of 20:48, 20 March 2026
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	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$75/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$75/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (~~TBA~~)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (available soon)
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System ~~(TBA)~~		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Microscopy, Focused Ion Beam (FIB)		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Microscopy, Focused Ion Beam (FIB)
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr

← Older revision		Revision as of 20:11, 11 November 2025
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	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford FlexAl ALD/ALE System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford FlexAl ALD/ALE System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor		! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$50/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System

← Older revision		Revision as of 20:18, 2 April 2026
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	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (available soon)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Cobra III-V ALE Etch System (available soon)
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \|~~Deposition~~, ~~Chemical Vapor~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \|Etch, RIE
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD "2" System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| ~~Microscopy~~, ~~Focused Ion Beam (FIB)~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$60/hr
	\|-		\|-
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	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford III-V Etch System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| ~~Microscopy~~, ~~Focused Ion Beam (FIB)~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Etch, RIE
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Dielectric Etch System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford Dielectric Etch System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| ~~Microscopy~~, ~~Focused Ion Beam (FIB)~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Etch, RIE
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford DRIE Etch System		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford DRIE Etch System
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| ~~Microscopy~~, ~~Focused Ion Beam (FIB)~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Etch, RIE
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
	! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD System (legacy)		! scope="col" style="text-align:left; background-color:#ffd8b4;" \|Oxford PECVD System (legacy)
	! scope="col" style="text-align:left; background-color:#ffe7d1;" \| ~~Microscopy~~, ~~Focused Ion Beam (FIB)~~		! scope="col" style="text-align:left; background-color:#ffe7d1;" \| Deposition, Chemical Vapor
	! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr		! scope="col" style="text-align:center; background-color:#FFFFFF;" \|$40/hr
	\|-		\|-
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	Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935		Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

	'''General Lab use is counted as time in the KNI cleanroom facility. It includes access to:'''		'''General Lab use is counted as time spent in the KNI cleanroom facility. It includes access to the following resources:'''
	*Atomic Force Microscope		*Atomic Force Microscope
	*Critical Point Dryer		*Critical Point Dryer
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	*Tube Furnaces (Wet, Dry Oxide + Annealing)		*Tube Furnaces (Wet, Dry Oxide + Annealing)
	*Wafer Stepper		*Wafer Stepper
	*Wet Chemistry Room~~/general supplies~~		*Wet Chemistry Room
	*Wire Bonder		*Wire Bonder
	*XeF2 Silicon Etcher		*XeF2 Silicon Etcher
	*Other tools not listed in the table above		*Other tools not listed in the table above
			*Cleanroom PPE, basic supplies

	'''Miscellaneous Rates'''		'''Miscellaneous Rates'''
	* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram.Staff-approved full service work is $100/hr.		* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram/A.
			* Staff-approved full service work is $100/hr.

	==Full-Service Work Requests ==		==Full-Service Work Requests ==