Optical Lithography Resources - Revision history

Bertm: /* Vendors for Photo Masks and Printed Plastic Films */

2023-03-07T20:01:07Z

Vendors for Photo Masks and Printed Plastic Films

← Older revision		Revision as of 20:01, 7 March 2023
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	*Toppan - https://www.photomask.com/ Toppan serves customers operating across a variety of market segments. They develop specialized solutions to fit your unique application.		*Toppan - https://www.photomask.com/ Toppan serves customers operating across a variety of market segments. They develop specialized solutions to fit your unique application.

			*PhotomaskPORTAL - https://www.photomaskportal.com/ PhotomaskPORTAL, Chrome Masks, Film Masks, Bare Substrates, and Resolution Targets.

Bertm: /* Photoresists provided by KNI: */

2023-01-05T21:10:57Z

Photoresists provided by KNI:

← Older revision		Revision as of 21:10, 5 January 2023
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	*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])		*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])
	*'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):		*'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):
	'''''Laurell Spinner Resources'''''
			'''''Laurell Spinner Resources:'''''

	* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner Cleaning SOP]		* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner Cleaning SOP]
	* [https://caltech.box.com/s/evjv6kciuamgl42moa8vug60dpc0gimp Laurell Spinner - Spinning Resist Video]		* [https://caltech.box.com/s/evjv6kciuamgl42moa8vug60dpc0gimp Laurell Spinner - Spinning Resist Video]

Bertm: /* KNI Photoresists */

2023-01-05T16:59:45Z

KNI Photoresists

← Older revision		Revision as of 16:59, 5 January 2023
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	*'''AZ 3330-F''': medium resolution resist, high thermal stability, optimized for metal RIE etch or plating process environments. 1.0-5.0µm spinnable ([http://www.imicromaterials.com/index.php/products/ig-line-photoresists/az-3300-series Product Page])		*'''AZ 3330-F''': medium resolution resist, high thermal stability, optimized for metal RIE etch or plating process environments. 1.0-5.0µm spinnable ([http://www.imicromaterials.com/index.php/products/ig-line-photoresists/az-3300-series Product Page])
	*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])		*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])
			*'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):
	'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):'''		'''''Laurell Spinner Resources'''''
			* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner Cleaning SOP]
			* [https://caltech.box.com/s/evjv6kciuamgl42moa8vug60dpc0gimp Laurell Spinner - Spinning Resist Video]

	'''''Reminder of lamp intensities:'''''		'''''Reminder of lamp intensities:'''''

Bertm at 16:04, 17 March 2022

2022-03-17T16:04:50Z

← Older revision		Revision as of 16:04, 17 March 2022
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	*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]		*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]

	==Vendors for Photo ~~Mask~~ and Printed Plastic Films==		==Vendors for Photo Masks and Printed Plastic Films==
	Here are a few companies which have been used by some of our member in the cleanroom:		Here are a few companies which have been used by some of our member in the cleanroom:

Bertm at 18:31, 16 March 2022

2022-03-16T18:31:12Z

← Older revision		Revision as of 18:31, 16 March 2022
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	Here are a few companies which have been used by some of our member in the cleanroom:		Here are a few companies which have been used by some of our member in the cleanroom:

	*CAD/Art services - http://www.outputcity.com/index.html used for making quality printed plastic films.		*CAD/Art services - http://www.outputcity.com/index.html used for making quality printed plastic films. The highest resolution is 10 um.

	*Photo Sciences - https://www.photo-sciences.com/ photomasks, custom patterned optics and reticles, metal shadow / deposition masks and shims, imaged indium tin-oxide (ITO), multi-stacking applications and more; for commercial, defense, bio-medical, research and universities..		*Photo Sciences - https://www.photo-sciences.com/ photomasks, custom patterned optics and reticles, metal shadow / deposition masks and shims, imaged indium tin-oxide (ITO), multi-stacking applications and more; for commercial, defense, bio-medical, research and universities..

	*Toppan - https://www.photomask.com/ Toppan serves customers operating across a variety of market segments. They develop specialized solutions to fit your unique application.		*Toppan - https://www.photomask.com/ Toppan serves customers operating across a variety of market segments. They develop specialized solutions to fit your unique application.

Bertm at 18:18, 16 March 2022

2022-03-16T18:18:00Z

← Older revision		Revision as of 18:18, 16 March 2022
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	=KNI Photoresists=		=KNI Photoresists=

	Photoresists provided by KNI:		==Photoresists provided by KNI:==

	*'''S1805, 1813, 1818''': field standard positive, may be used for liftoff and withstands some acid etching. Designed with lower toxicity materials. ([https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf Manufacturer Spec Sheet]) Shipley 1800 series 0.5-1.9μm range available. 0.5-3.2μm available from manufacturer. Suitable for multiple applications but not niche optimized as latter resists.		*'''S1805, 1813, 1818''': field standard positive, may be used for liftoff and withstands some acid etching. Designed with lower toxicity materials. ([https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf Manufacturer Spec Sheet]) Shipley 1800 series 0.5-1.9μm range available. 0.5-3.2μm available from manufacturer. Suitable for multiple applications but not niche optimized as latter resists.
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	*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])		*'''AZ 4620''': improved surface adhesion for etching and plating applications, photosensitivity is broad and low, spinnable to 6 - 20 µm.([https://www.microchemicals.com/products/photoresists/az_p4620.html Product Page])

	SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):		'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):'''



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	\|}		\|}

	~~=Other Photoresists=~~		=Non-KNI Photoresist Recipes=

	*[https://cleanroom.byu.edu/resistmanufacturers BYU Comprehensive list of photoresists]

	*[https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Photolithography_Recipes UCSB Photoresist Recipes Page 1]

	*[https://www.nanotech.ucsb.edu/wiki/index.php/Contact_Alignment_Recipes UCSB Photoresist Recipes Page 2]

	*[https://cleanroom.byu.edu/photoresists BYU Photoresist Recipes]

	*'''SU-8 2002, 2025, 2075, 2100, 3025, 3050''': epoxy-based negative resist. Optimal for tall high-aspect ratio permanent structures. ([https://kayakuam.com/products/su-8-photoresists/ Manufacturer Spec Sheet ]). Difficult to remove. Spinnable to 1.5-200μm thickness.

	==Non-KNI Photoresist Recipes==
	{\| class="wikitable sortable" style="text-align: center;"		{\| class="wikitable sortable" style="text-align: center;"
	\|-		\|-
	! Resist !! Wafer Prep !! Spin !! Thickness !! Prebake !! Exposure !! Postbake !! Flood !! Development !! Hardbake !! Lamp !! Notes		! Resist !! Wafer Prep !! Spin !! Thickness !! Prebake !! Exposure !! Postbake !! Flood !! Development !! Hardbake !! Lamp !! Notes
	\|-		\|-
			==SPR Recipes==
	\| SPR 220-7.0 \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| -		\| SPR 220-7.0 \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| - \|\| -
	\|-		\|-
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	==SU-8 Recipes==		==SU-8 Recipes==
			'''SU8 Photoresists are no longer provided by KNI (SU8 Developer IS provided by KNI):'''

	~~SU-8 is available in thicknesses ranging from 500nm to 500microns. Remember to use Laurel Spinner 1 and develop in the Wet Chemistry room on the Solvent Bench.~~

	[https://~~cleanroom~~.~~byu.edu~~/~~su8 BYU SU~~-8 ~~Guide~~]		SU-8 is available in thicknesses ranging from 500nm to 500microns. Remember to use ONLY Laurel Spinner 1 and develop in the Wet Chemistry room on the Solvent Bench.

			*'''SU-8 2002, 2025, 2075, 2100, 3025, 3050''': epoxy-based negative resist. Optimal for tall high-aspect ratio permanent structures. ([https://kayakuam.com/products/su-8-photoresists/ Kayaku Manufacturer Spec Sheet ]). Difficult to remove. Spinnable to 1.5-200μm thickness.

	{\| class="wikitable sortable" style="text-align: center;"		{\| class="wikitable sortable" style="text-align: center;"
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	=Addtional Photolithography Resources=		=Addtional Photolithography Resources=
			==Terms and Definitions==

	*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]		*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]
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	*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]		*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]

			==Vendors for Photo Mask and Printed Plastic Films==
			Here are a few companies which have been used by some of our member in the cleanroom:

			*CAD/Art services - http://www.outputcity.com/index.html used for making quality printed plastic films.

			*Photo Sciences - https://www.photo-sciences.com/ photomasks, custom patterned optics and reticles, metal shadow / deposition masks and shims, imaged indium tin-oxide (ITO), multi-stacking applications and more; for commercial, defense, bio-medical, research and universities..

			*Toppan - https://www.photomask.com/ Toppan serves customers operating across a variety of market segments. They develop specialized solutions to fit your unique application.

Bertm: /* Addtional Photolithography Resources */

2022-03-16T17:24:39Z

Addtional Photolithography Resources

← Older revision		Revision as of 17:24, 16 March 2022
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	*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]		*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]

	*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]

Bertm: /* Addtional Photolithography Resources */

2022-03-16T17:24:21Z

Addtional Photolithography Resources

← Older revision		Revision as of 17:24, 16 March 2022
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	=Addtional Photolithography Resources=		=Addtional Photolithography Resources=

			*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]

	*[https://cleanroom.byu.edu/processes BYU Intigrated Microfabrication Lab - Microfabrication Processes, check out their Lithography section]		*[https://cleanroom.byu.edu/processes BYU Intigrated Microfabrication Lab - Microfabrication Processes, check out their Lithography section]
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	*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]		*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]

	*[https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm Resolution Limits of Photolithography]

Bertm: /* Addtional Photolithography Resources */

2022-03-16T17:10:58Z

Addtional Photolithography Resources

← Older revision		Revision as of 17:10, 16 March 2022
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	*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]		*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]

	*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography ~~Terminology~~]		*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terms]

	*[https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm Resolution Limits of Photolithography]		*[https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm Resolution Limits of Photolithography]

Bertm: /* Addtional Photolithography Resources */

2022-03-16T17:10:12Z

Addtional Photolithography Resources

← Older revision		Revision as of 17:10, 16 March 2022
Line 131:		Line 131:
	*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]		*[https://cleanroom.byu.edu/definitions BYU Intigrated Microfabrication Lab - Photolithography Terms and Definitions]

	*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Lithography Terminology]		*[https://kayakuam.com/techreferences/lithography-terms/ Kayaku Advanced Materials - Lithography Terminology]

	*[https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm Resolution Limits of Photolithography]		*[https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm Resolution Limits of Photolithography]