FlexAL II: Atomic Layer Deposition (ALD) - Revision history

Tkimoto at 18:24, 24 July 2026

2026-07-24T18:24:59Z

← Older revision		Revision as of 18:24, 24 July 2026
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	== Resources ==		== Resources ==
	===== Equipment Status =====		===== Equipment Status =====
	* [https://~~labrunr~~.caltech.edu/~~Equipment_2~~.aspx ~~LabRunr Equipment Status~~] ~~(Select ALD from the dropdown menu)~~		* [https://mh-fbs1.caltech.edu/Anon/Logon.aspx?ReturnUrl=%2fApps%2fFBS%2fDefault.aspx%3ff%3d613&f=613 FBS Login - User Dashboard]

	===== SOPs & Troubleshooting =====		===== SOPs & Troubleshooting =====
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	* [https://caltech.box.com/s/29e5taof6r80d45lfb4sgbup1k6rebpx Gas Status Board SOP]		* [https://caltech.box.com/s/29e5taof6r80d45lfb4sgbup1k6rebpx Gas Status Board SOP]

	===== Process Documents ~~(<i>login to LabRunr required</i>)~~=====		===== Process Documents=====
	* [https://labrunr.caltech.edu/machinefiles/154/Oxford%20Instruments%20ALD%20Materials%20Example%20Guide%20-%202017-10-25.pdf Oxford Instruments ALD Materials Example Guide]		* [https://labrunr.caltech.edu/machinefiles/154/Oxford%20Instruments%20ALD%20Materials%20Example%20Guide%20-%202017-10-25.pdf Oxford Instruments ALD Materials Example Guide]
	* [https://labrunr.caltech.edu/machinefiles/154/OxfordInstruments%20ALD%20-%20gases%20and%20precursors.pdf Oxford Instruments ALD gases and precursors]		* [https://labrunr.caltech.edu/machinefiles/154/OxfordInstruments%20ALD%20-%20gases%20and%20precursors.pdf Oxford Instruments ALD gases and precursors]

Tkimoto: /* Chemical Vapor Deposition */

2026-01-22T22:18:29Z

Chemical Vapor Deposition

← Older revision		Revision as of 22:18, 22 January 2026
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	===== Chemical Vapor Deposition =====		===== Chemical Vapor Deposition =====
	* [[FlexAL II: Atomic Layer Deposition (ALD)\|FlexAL II: Atomic Layer Deposition (ALD)]]		* [[FlexAL II: Atomic Layer Deposition (ALD)\|FlexAL II: Atomic Layer Deposition (ALD)]]
	* [[~~Plasma-Enhanced Chemical Vapor~~ Deposition (PECVD)\|~~Plasma-Enhanced Chemical Vapor~~ Deposition (PECVD)]]		* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD\|Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

Kmmckenz: /* SOPs & Troubleshooting */ added reservation policy

2023-08-22T21:02:08Z

SOPs & Troubleshooting: added reservation policy

← Older revision		Revision as of 21:02, 22 August 2023
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	===== SOPs & Troubleshooting =====		===== SOPs & Troubleshooting =====
	* [https://caltech.box.com/s/97mn2fyncejg6d4uo5lwtyl98w8n9gd2 KNI SOP]		* [https://caltech.box.com/s/97mn2fyncejg6d4uo5lwtyl98w8n9gd2 KNI ALD SOP]
			* [https://caltech.box.com/s/0gh89zgxkchj8nkbl1bbrdgvspu31obc Oxfords reservation and use policy]
	* [https://caltech.box.com/s/4qbaqhklg9bak0hlgd469d1ixxtttgxp Etcher toxic gas handling SOP]		* [https://caltech.box.com/s/4qbaqhklg9bak0hlgd469d1ixxtttgxp Etcher toxic gas handling SOP]
	* [https://caltech.box.com/s/jesslkguhfgdl9pud83mmtm2ruf6vb50 Power Up Oxford ICP-RIE SOP]		* [https://caltech.box.com/s/jesslkguhfgdl9pud83mmtm2ruf6vb50 Power Up Oxford ICP-RIE SOP]

Derose: /* Equipment Data */

2022-06-30T05:29:05Z

Equipment Data

← Older revision		Revision as of 05:29, 30 June 2022
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	== Resources ==		== Resources ==
	===== Equipment ~~Data~~ =====		===== Equipment Status =====
	* [https://caltech.~~box~~.~~com/s/lul90odaqj4rp9inb6qt2mft2ean0qqa Deposition Pass-down equipment information~~]		* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select ALD from the dropdown menu)

	===== SOPs & Troubleshooting =====		===== SOPs & Troubleshooting =====
	* [https://caltech.box.com/s/97mn2fyncejg6d4uo5lwtyl98w8n9gd2 KNI SOP]		* [https://caltech.box.com/s/97mn2fyncejg6d4uo5lwtyl98w8n9gd2 KNI SOP]

Kmmckenz: Added to precursor list: BDEAS (silicon) (SDS coming soon)

2022-04-28T19:36:22Z

Added to precursor list: BDEAS (silicon) (SDS coming soon)

← Older revision		Revision as of 19:36, 28 April 2022
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	* [https://caltech.box.com/s/pkjuqifvnzle2eanykhvhe4m8hu6qgye TDMAT (titanium)]		* [https://caltech.box.com/s/pkjuqifvnzle2eanykhvhe4m8hu6qgye TDMAT (titanium)]
	* [https://caltech.box.com/s/jurskhuqjxhpnmtl5iwfmgpj8d3apmy3 BTBAS (silicon)]		* [https://caltech.box.com/s/jurskhuqjxhpnmtl5iwfmgpj8d3apmy3 BTBAS (silicon)]
			* BDEAS (silicon) (SDS coming soon)
	* [https://caltech.box.com/s/6zdhb6n1yr78wgy9mtjzqkljo75vxb75 TDMAH (hafnium)]		* [https://caltech.box.com/s/6zdhb6n1yr78wgy9mtjzqkljo75vxb75 TDMAH (hafnium)]
	* [https://caltech.box.com/s/pznx6n00avfmmp47h3esqkkc7hsrw04d TBTDEN (niobium)]		* [https://caltech.box.com/s/pznx6n00avfmmp47h3esqkkc7hsrw04d TBTDEN (niobium)]

Kmmckenz: update primary staff

2021-09-21T23:30:39Z

update primary staff

← Older revision		Revision as of 23:30, 21 September 2021
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	\|RoomLocation = B235 Steele		\|RoomLocation = B235 Steele
	\|LabPhone = 626-395-1532		\|LabPhone = 626-395-1532
	\|PrimaryStaff = [[~~Nathan S. Lee~~]]		\|PrimaryStaff = [[Kelly McKenzie]]
	\|StaffEmail = ~~nathslee~~@caltech.edu		\|StaffEmail = kmmckenz@caltech.edu
	\|StaffPhone = 626-395-~~1319~~		\|StaffPhone = 626-395-5732
	\|Manufacturer = Oxford Instruments		\|Manufacturer = Oxford Instruments
	\|Techniques = Atomic Layer Deposition of <br>Oxides and Nitrides		\|Techniques = Atomic Layer Deposition of <br>Oxides and Nitrides

Nathslee at 18:36, 30 July 2021

2021-07-30T18:36:58Z

← Older revision		Revision as of 18:36, 30 July 2021
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	\|Manufacturer = Oxford Instruments		\|Manufacturer = Oxford Instruments
	\|Techniques = Atomic Layer Deposition of <br>Oxides and Nitrides		\|Techniques = Atomic Layer Deposition of <br>Oxides and Nitrides
	\|EmailList = kni-~~oxfordpecvd~~		\|EmailList = kni-ald
	\|EmailListName = Oxford ~~PECVD~~		\|EmailListName = Oxford FlexAl ALD
	\|Model = FlexAL II		\|Model = FlexAL II
	}}		}}

Derose: /* ALD Precursor List */

2020-10-15T01:04:37Z

ALD Precursor List

← Older revision		Revision as of 01:04, 15 October 2020
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	* [https://caltech.box.com/s/djtj0j1671dvo6to8x0t56g2b8ekvmrz Ar]		* [https://caltech.box.com/s/djtj0j1671dvo6to8x0t56g2b8ekvmrz Ar]

	===== ALD Precursor List =====		===== ALD Precursor List (Links to SDS) =====
	* TMA (aluminum)		* [https://caltech.box.com/s/hff83jq4x96new2sgczzvwgacy7tsl0e TMA (aluminum)]
	* TDMAT (titanium)		* [https://caltech.box.com/s/pkjuqifvnzle2eanykhvhe4m8hu6qgye TDMAT (titanium)]
	* BTBAS (silicon)		* [https://caltech.box.com/s/jurskhuqjxhpnmtl5iwfmgpj8d3apmy3 BTBAS (silicon)]
	* TDMAH (hafnium)		* [https://caltech.box.com/s/6zdhb6n1yr78wgy9mtjzqkljo75vxb75 TDMAH (hafnium)]
	* TBTDEN (niobium)		* [https://caltech.box.com/s/pznx6n00avfmmp47h3esqkkc7hsrw04d TBTDEN (niobium)]
	* Others upon request		* Others upon request

Derose: /* ALD Gas List */

2020-10-15T00:15:24Z

ALD Gas List

← Older revision		Revision as of 00:15, 15 October 2020
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	* Hard masks compatible with process temperature		* Hard masks compatible with process temperature

	===== ALD Gas List =====		===== ALD Gas List (links to SDS) =====
	* SF<sub>6</sub>		* [https://caltech.box.com/s/4ydr6ju2pbvulef7e0vzlb8i58nijkrg SF<sub>6</sub>]
	* N<sub>2</sub>		* [https://caltech.box.com/s/s3oi147iafil7ruil2dwgw5kxn9je2a5 N<sub>2</sub>]
	* O<sub>2</sub>		* [https://caltech.box.com/s/sar0sdkzrjyvzh63gww199558297rzaj O<sub>2</sub>]
	* O<sub>3</sub>		* [https://caltech.box.com/s/f08m19vgz2sir41vzqdkql4wcpcsc7nz O<sub>3</sub>]
	* NH<sub>3</sub>		* [https://caltech.box.com/s/g4r8qnbmn4gfdly1knni5rhnubpuq0zv NH<sub>3</sub>]
	* H<sub>2</sub>		* [https://caltech.box.com/s/f6080rhdsuu8mblne62c02oapl7319cg H<sub>2</sub>]
	* Ar		* [https://caltech.box.com/s/djtj0j1671dvo6to8x0t56g2b8ekvmrz Ar]

	===== ALD Precursor List =====		===== ALD Precursor List =====

Derose: /* Description */

2020-10-14T23:59:52Z

Description

← Older revision		Revision as of 23:59, 14 October 2020
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	}}		}}
	== Description ==		== Description ==
	The Atomic Layer Deposition (ALD) system is an Oxford Instruments Plasma Technology FlexAL II platform that is designed to grow thin films one atomic layer at a time under very precise deposition conditions. It is configured with a 240 mm diameter resistance-heated, RF-biased aluminum electrode with temperature control to 600 °C, and substrate sizes up to 6 inches (150 mm). There is an inductively-coupled plasma (ICP) source for plasma-enhanced ALD, as well as the more traditional thermal processes, with six precursor gases to grow a variety of high-purity oxides and nitrides.		The Atomic Layer Deposition (ALD) system is an Oxford Instruments Plasma Technology FlexAL II platform that is designed to grow thin films one atomic layer at a time under very precise deposition conditions. It is configured with a 240 mm diameter resistance-heated, RF-biased aluminum electrode with temperature control to 600 °C, and substrate sizes up to 6 inches (150 mm), with optional configuration for 8 inches (200 mm). There is an inductively-coupled plasma (ICP) source for plasma-enhanced ALD, as well as the more traditional thermal processes, with six precursor gases to grow a variety of high-purity oxides and nitrides.

			Some film examples by KNI lab members include thermally-grown conductive TiO<sub>2</sub> as protective coatings for semiconducting photoanodes in water-splitting cells, thermal and plasma-assisted Al<sub>2</sub>O<sub>3</sub> and HfO<sub>2</sub> as gate dielectrics in 2D transition metal dichalcogenide materials, as well as NbN and TiN deposition.

	===== Applications =====		===== Applications =====