CNI-PV 2.1: Nano Imprint Lithography - Revision history

Derose at 19:13, 29 June 2024

2024-06-29T19:13:52Z

← Older revision		Revision as of 19:13, 29 June 2024
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	\|RoomLocation = B217 Steele		\|RoomLocation = B217 Steele
	\|LabPhone = 626-395-1536		\|LabPhone = 626-395-1536
	\|PrimaryStaff = ~~Bert Mendoza~~		\|PrimaryStaff = Guy DeRose
	\|StaffEmail = ~~bertm~~@caltech.edu		\|StaffEmail = derose@caltech.edu
	\|StaffPhone = 626-395-~~4075~~		\|StaffPhone = 626-395-3423
	\|Manufacturer = NIL Technology		\|Manufacturer = NIL Technology
	\|Techniques = Thermal and UV Nanoimprint Lithography		\|Techniques = Thermal and UV Nanoimprint Lithography
	\|RequestTraining = mailto: ~~bertm~~@caltech.edu		\|RequestTraining = mailto: derose@caltech.edu
	\|EmailListName = kni-photolith		\|EmailListName = kni-photolith
	\|EmailList = kni-photolith@caltech.edu		\|EmailList = kni-photolith@caltech.edu

Sydney: Adjusted text to refer to FBS instead of LabRunr

2024-04-15T22:57:00Z

Adjusted text to refer to FBS instead of LabRunr

← Older revision		Revision as of 22:57, 15 April 2024
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	* [https://caltech.box.com/s/3hxilag7uca8wurqkscar8jbtbzmczf3 NILT - Operation SOP]		* [https://caltech.box.com/s/3hxilag7uca8wurqkscar8jbtbzmczf3 NILT - Operation SOP]

	===== ~~Labrunr~~ Reservation Rules:=====		===== FBS Reservation Rules:=====
	{\| class="wikitable"		{\| class="wikitable"
	\|-		\|-

Bertm: /* General SOPs */

2023-03-28T15:11:26Z

General SOPs

← Older revision		Revision as of 15:11, 28 March 2023
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	* [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]		* [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]
	===== General SOPs =====		===== General SOPs =====
			* [https://caltech.box.com/s/3hxilag7uca8wurqkscar8jbtbzmczf3 NILT - Operation SOP]

	===== Labrunr Reservation Rules:=====		===== Labrunr Reservation Rules:=====
	{\| class="wikitable"		{\| class="wikitable"

Bertm: /* Labrunr Reservation Rules: */

2022-06-02T17:24:58Z

Labrunr Reservation Rules:

← Older revision		Revision as of 17:24, 2 June 2022
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	\| Weekend \|\| 14 \|\| 6 \|\| 18		\| Weekend \|\| 14 \|\| 6 \|\| 18
	\|}		\|}
	''' ~~Email the tool manager for~~ reservations that ~~do not~~ follow the reservation policy BEFORE scheduling ~~the reservation~~.'''		''' For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
	'' Your reservation can be cancelled any time by the tool manager if it does not follow the tool reservation policy.''		'' Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''

	===== Training Materials =====		===== Training Materials =====

Bertm: /* Labrunr Reservation Rules: */

2022-06-02T15:46:19Z

Labrunr Reservation Rules:

← Older revision		Revision as of 15:46, 2 June 2022
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	* [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]		* [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]
	===== General SOPs =====		===== General SOPs =====
	=== Labrunr Reservation Rules:===		===== Labrunr Reservation Rules:=====
	{\| class="wikitable"		{\| class="wikitable"
	\|-		\|-
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	* [https://youtu.be/YzzHchJZaCw Hot Embossing Demo from NILT (YouTube - external)]		* [https://youtu.be/YzzHchJZaCw Hot Embossing Demo from NILT (YouTube - external)]
	===== Manufacturer Manuals =====		===== Manufacturer Manuals =====
	*		*

	== Specifications ==		== Specifications ==
	* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate		* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate

Bertm: /* General SOPs */

2022-06-02T15:45:13Z

General SOPs

@@ Line 31: / Line 31: @@
 * [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]
 ===== General SOPs =====
+=== Labrunr Reservation Rules:===
 ===== Training Materials =====
+*

Derose at 16:28, 12 October 2020

2020-10-12T16:28:36Z

← Older revision		Revision as of 16:28, 12 October 2020
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	\|InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System		\|InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System
	\|HeaderColor = #F5A81C		\|HeaderColor = #F5A81C
	\|ImageResearch = ~~Research~~.~~jpg~~		\|ImageResearch = NILT_Imprint_process.png
	\|ImageInstrument = ~~Instrument~~.~~jpg~~		\|ImageInstrument = CNI_NILT_wiki.jpeg
	\|InstrumentType = Lithography		\|InstrumentType = Lithography
	\|RoomLocation = B217 Steele		\|RoomLocation = B217 Steele
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	== Resources ==		== Resources ==
	===== Equipment Data =====		===== Equipment Data =====
	*		* [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description]
	===== General SOPs =====		===== General SOPs =====
	*		*
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	*		*
	===== Sample Prep and Writing SOPs =====		===== Sample Prep and Writing SOPs =====
	*		* [https://caltech.box.com/s/8tv6lvwmwbecgwd9qayq73mbdje4klmk NanoImprint Resists flyer]
			* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP]
	===== Advanced Troubleshooting SOPs =====		===== Advanced Troubleshooting SOPs =====
	*		*
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	*		*
	===== Lithography Process Information =====		===== Lithography Process Information =====
	* [https://~~caltech~~.~~box.com/s~~/~~jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP~~]		* [https://youtu.be/YzzHchJZaCw Hot Embossing Demo from NILT (YouTube - external)]

	===== Manufacturer Manuals =====		===== Manufacturer Manuals =====
	*		*

Derose: /* Specifications */

2020-09-28T23:30:18Z

Specifications

← Older revision		Revision as of 23:30, 28 September 2020
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	== Specifications ==		== Specifications ==
	* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate		* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
	* UV ~~nanoImprint~~ up to 200 mm wafers		* UV NanoImprint up to 200 mm wafers
	<br>		<br>
	<br>		<br>

	== Related Instrumentation in the KNI ==		== Related Instrumentation in the KNI ==
	===== Electron Beam Lithography =====		===== Electron Beam Lithography =====

Derose: Created page with "{{instrument|{{PAGENAME}} |InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System |HeaderColor = #F5A81C |ImageResearch = Research.jpg |ImageInstrument = I..."

2020-09-28T23:29:38Z

Created page with "{{instrument|{{PAGENAME}} |InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System |HeaderColor = #F5A81C |ImageResearch = Research.jpg |ImageInstrument = I..."

New page

{{instrument|{{PAGENAME}}
|InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System
|HeaderColor = #F5A81C
|ImageResearch = Research.jpg
|ImageInstrument = Instrument.jpg
|InstrumentType = Lithography
|RoomLocation = B217 Steele
|LabPhone = 626-395-1536
|PrimaryStaff = Bert Mendoza
|StaffEmail = bertm@caltech.edu
|StaffPhone = 626-395-4075
|Manufacturer = NIL Technology
|Techniques = Thermal and UV Nanoimprint Lithography
|RequestTraining = mailto: bertm@caltech.edu
|EmailListName = kni-photolith
|EmailList = kni-photolith@caltech.edu
}}
== Description ==
The NIL Technology CNI-PV 2.1 Nano Imprint Lithography System is a lithography tool that is used to enable nanoscale printing by thermal or UV exposure of photoresist with an imprint stamp. Vacuum in the imprint chamber is enabled down to 1 micron, and thermal imprint of up to 240°C is available. The system is compatible with UV-cured resists, and has an integral UV light source for those processes. It allows up to 200 mm diameter substrates with UV, or up to 150x150 mm substrates with thermal processing.
===== Operational Applications =====
* Thermal Nano Imprint Lithography
* UV Nano Imprint Lithography

===== Scientific / Technical Applications =====
* Nanophotonics
* Nano-optics
* Waveguides

== Resources ==
===== Equipment Data =====
*
===== General SOPs =====
*
===== Training Materials =====
*
===== Sample Prep and Writing SOPs =====
*
===== Advanced Troubleshooting SOPs =====
*
===== Data Preparation Resources =====
*
===== Lithography Process Information =====
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP]

===== Manufacturer Manuals =====
*
== Specifications ==
* Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
* UV nanoImprint up to 200 mm wafers
<br>
<br>
== Related Instrumentation in the KNI ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]