2026-01-08T23:13:47Z

Ykim3: /* List of Managed Instruments */

__NOTOC__
{{StaffMemberInfobox
|StaffName = Yonghwi Kim
|StaffPhoto = Yonghwi-kim.jpg
|JobTitle = Electron and Ion Microscope Manager
|AreasResponsibility = Scanning Electron Microscope, Focused Ion Beam (Helium/Neon/Gallium FIB), Atomic Force Microscope, Carbon Evaporator & Metal Sputter Coater, Profilometer
|CaltechID = ykim
|Phone = 626-395-5994 (office)
|OfficeLocation = 303 Steele
}}
== About ==
===== Role in the KNI =====
Yonghwi Kim is the Electron and Ion Microscope Manager at the Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He oversees the daily operation of the Quanta scanning electron microscope (SEM) with environmental mode (ESEM), Sirion field emission SEM, Nova 600 focused ion beam (FIB), Zeiss ORION NanoFab Helium/Neon/Gallium FIB, atomic force microscope, and profilometer. In this role, he trains researchers in equipment operation and provides technical support to enable impactful scientific discoveries.

Yonghwi joined Caltech in 2013 as a Ph.D. student in Electrical Engineering, conducting his doctoral research in Prof. Harry A. Atwater’s group on electrically reconfigurable nanophotonic devices based on phase-transition materials. After completing his Ph.D., he pursued postdoctoral research at NTT Research while serving as a Visiting Associate at Caltech, where he advanced nanofabrication methods for nonlinear optical waveguides in the KNI cleanroom. He returned to Caltech in 2025 to continue his technical career as the Electron and Ion Microscope Manager at the KNI.

===== Education =====
Yonghwi received his Ph.D. and M.S. degrees in Electrical Engineering from Caltech under the supervision of Prof. Harry A. Atwater. Prior to that, he earned his B.S. and M.S. degrees in Electrical and Electronic Engineering from Yonsei University in Seoul, South Korea, advised by Prof. Donghyun Kim.

==== List of Managed Instruments ====

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Sirion: SEM & EDS]]
===== Conductive thin film deposition for high resolution SEM and TEM applications =====
* [[Carbon Evaporator | Carbon Evaporator & Metal Sputter Coater: Leica EM ACE600]]
===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
===== Optical Metrology =====
* [[Keyence VK-X3000: Profilometer | Profilometer: Keyence VK-X3000]]

== Selected Publications ==
• '''Kim, Y.''' et al., “[https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01246 Phase Modulation with Electrically Tunable Vanadium Dioxide Phase-Change Metasurfaces],” '''''Nano Letters''''', 2019.

• '''Kim, Y'''. et al., "[https://pubs.aip.org/aip/apl/article-abstract/101/23/233701/1077838/Nanogap-based-dielectric-specific-colocalization?redirectedFrom=fulltext Nanogap-based dielectric-specific colocalization for highly sensitive surface plasmon resonance detection of biotin-streptavidin interactions]," '''''Applied Physics Letters''''', 2012.

• Gao, R., Kelzenberg M. D., '''Kim, Y.''' et al., “[https://pubs.acs.org/doi/10.1021/acsphotonics.1c02022 Optical characterization of silicon nitride metagrating-based lightsails for self-stabilization],” '''''ACS Photonics''''', 2022.

• Shayegan, K. J., Zhao, B., '''Kim, Y.''' et al., “[https://www.science.org/doi/10.1126/sciadv.abm4308 Nonreciprocal infrared absorption via resonant magneto-optical coupling to InAs],” '''''Science Advances''''', 2022.

• '''Kim, Y.''' et al., “[https://www.osti.gov/biblio/1998419 Electrically Tunable Metasurfaces Incorporating A Phase Change Material],” '''''U.S. Patent''','' 2024''.''-->

<!---* [[ Nova 200 NanoLab: SEM & EDS]]---!>

Carbon Evaporator

2026-01-08T23:09:12Z

Ykim3:

{{InstrumentInfoboxOneImage|
|InstrumentName = Carbon Evaporator & Sputter Coater
|HeaderColor = #F2682A
|ImageOne = Leica-EM-ACE600-Coater.jpg
|ImageTwo = EM-ACE600-Carbon-Evaporator.jpg
|InstrumentType = [[Equipment_List#Deposition|Deposition]], [[Equipment_List#Sample_Preparation_for_Microscopy|Sample Prep for Microscopy]]
|RoomLocation = B233 Steele
|LabPhone = 626-395-5885
|PrimaryStaff = [[Yonghwi Kim]]
|StaffEmail = ykim@caltech.edu
|StaffPhone = 626-395-5994
|Manufacturer = Leica
|Model = EM ACE600
|Techniques = Carbon Deposition and Gold Sputtering
|EmailList = kni-sem-fib
|EmailListName = SEM-FIB
}}
== Description ==
For non-conductive specimens that cannot be effectively SEM- or FIB-imaged with some combination of low voltage, low current, zero detector bias, and scanning filters, depositing a thin conductive layer of carbon on the surface can improve imaging. This carbon evaporator produces high-quality amorphous films with thicknesses ranging from sub-nm to 10 nm, with a morphology that is generally undetectable in electron microscopes. After imaging, the carbon layer can be gently removed using an O2 plasma, for example, with the lab's[[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Tergeo Plus Plasma Cleaner]]. The is also equipped with a metal sputtering capability (e.g., Au), which produces a fine-grained metallic layer and expands its range of applications.

===== Applications =====
* Coat a material surface to make a sample conductive for SEM or FIB imaging.
* Coat resist surface to make a ample conductive for e-beam lithography.
* Apply carbon to a specimen or device for other fabrication purposes.

===== Possible Target Materials & Deposition Methods =====
* Carbon — via evaporation
* Metal (e.g., Au, Pt, Cr, W) — via sputtering

== Resources ==
===== Equipment Data =====

[[Image:Carbon-Evaporator-Source-Thread.jpg|thumb|top|upright=0.9|The Carbon Evaporator source needs to be periodically disconnected from the instrument by the user so that the carbon thread can be changed; see the SOP and notes in the SOP section on this page for instructions on how to change the thread]]

===== SOP & Troubleshooting =====
* [https://caltech.box.com/s/1l8kxgkiti1kgmvysl2tpu68r1desi8m SOP & Troubleshooting Guide]
* The procedure to install a new carbon thread can be found on [https://www.manualslib.com/manual/1525180/Leica-Em-Ace600.html?page=43#manual Page 39 of the Operating Manual]
** Note: always install as a "double thread," i.e. double the thread back over itself before installing – a thread length that is approximately twice the length of the evaporator's door width is long enough to double over and install.

===== Video =====
* [https://www.youtube.com/watch?v=Qj3Y-WfNbvM Leica's Product Overview Video]

===== Technical Notes =====
* [https://www.leica-microsystems.com/products/sample-preparation-for-electron-microscopy/p/leica-em-ace600/downloads/ Technical Notes Provided by Leica]
===== Manufacturer Manual =====
* [https://caltech.box.com/s/xx5psvz8u0jqszdqhh44fd5xkxmhz4a6 Operating Manual]

== Specifications ==
===== Manufacturer Specifications =====
* [https://www.leica-microsystems.com/fileadmin/downloads/Leica%20EM%20ACE600/Brochures/EMACECoaters_Brochure_09_17_EN.pdf Manufacturer Product Guide]

===== Carbon Evaporation Specifications =====
* Average Deposition Rate: ~1 nm per pulse, when using a double thread (i.e. a thread that is doubled over on itself; see notes in SOP section above)
* Monitor deposition thickness using the quartz crystal thickness monitor, or simply program the number of pulses that you want
 
 
== Related Instrumentation in the KNI ==
===== Sample Preparation for Microscopy =====
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[TEM Sample Preparation Equipment | TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill]]
===== Scanning Electron & Ion Microscopes =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe]]
* [[Nova 200 NanoLab: SEM, EDS & WDS | Nova 200 NanoLab: SEM, EDS & WDS]]
* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM, ESEM, Lithography & Probe Station]]
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium, Neon & Gallium FIB]]

2026-01-08T19:00:11Z

Ykim3:

2025-11-17T18:39:27Z

Ykim3:

{{InstrumentInfoboxOneImage|
|InstrumentName = Carbon Evaporator & Sputter Coater
|HeaderColor = #F2682A
|ImageOne = EM-ACE600-Carbon-Evaporator.jpg
|ImageTwo = EM-ACE600-Carbon-Evaporator.jpg
|InstrumentType = [[Equipment_List#Deposition|Deposition]], [[Equipment_List#Sample_Preparation_for_Microscopy|Sample Prep for Microscopy]]
|RoomLocation = B233 Steele
|LabPhone = 626-395-5885
|PrimaryStaff = [[Yonghwi Kim]]
|StaffEmail = ykim@caltech.edu
|StaffPhone = 626-395-5994
|Manufacturer = Leica
|Model = EM ACE600
|Techniques = Carbon Deposition and Gold Sputtering
|EmailList = kni-sem-fib
|EmailListName = SEM-FIB
}}
== Description ==
For non-conductive specimens that cannot be effectively SEM- or FIB-imaged with some combination of low voltage, low current, zero detector bias, and scanning filters, depositing a thin conductive layer of carbon on the surface can improve imaging. This carbon evaporator produces high-quality amorphous films with thicknesses ranging from sub-nm to 10 nm, with a morphology that is generally undetectable in electron microscopes. After imaging, the carbon layer can be gently removed using an O2 plasma, for example, with the lab's[[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Tergeo Plus Plasma Cleaner]]. The is also equipped with a metal sputtering capability (e.g., Au), which produces a fine-grained metallic layer and expands its range of applications.

===== Applications =====
* Coat a material surface to make a sample conductive for SEM or FIB imaging.
* Coat resist surface to make a ample conductive for e-beam lithography.
* Apply carbon to a specimen or device for other fabrication purposes.

== Resources ==
===== Equipment Data =====

[[Image:Carbon-Evaporator-Source-Thread.jpg|thumb|top|upright=0.9|The Carbon Evaporator source needs to be periodically disconnected from the instrument by the user so that the carbon thread can be changed; see the SOP and notes in the SOP section on this page for instructions on how to change the thread]]

===== SOP & Troubleshooting =====
* [https://caltech.box.com/s/1l8kxgkiti1kgmvysl2tpu68r1desi8m SOP & Troubleshooting Guide]
* The procedure to install a new carbon thread can be found on [https://www.manualslib.com/manual/1525180/Leica-Em-Ace600.html?page=43#manual Page 39 of the Operating Manual]
** Note: always install as a "double thread," i.e. double the thread back over itself before installing – a thread length that is approximately twice the length of the evaporator's door width is long enough to double over and install.

===== Video =====
* [https://www.youtube.com/watch?v=Qj3Y-WfNbvM Leica's Product Overview Video]

===== Technical Notes =====
* [https://www.leica-microsystems.com/products/sample-preparation-for-electron-microscopy/p/leica-em-ace600/downloads/ Technical Notes Provided by Leica]
===== Manufacturer Manual =====
* [https://caltech.box.com/s/xx5psvz8u0jqszdqhh44fd5xkxmhz4a6 Operating Manual]

== Specifications ==
===== Manufacturer Specifications =====
* [https://www.leica-microsystems.com/fileadmin/downloads/Leica%20EM%20ACE600/Brochures/EMACECoaters_Brochure_09_17_EN.pdf Manufacturer Product Guide]

===== Carbon Evaporation Specifications =====
* Average Deposition Rate: ~1 nm per pulse, when using a double thread (i.e. a thread that is doubled over on itself; see notes in SOP section above)
* Monitor deposition thickness using the quartz crystal thickness monitor, or simply program the number of pulses that you want
 
 
== Related Instrumentation in the KNI ==
===== Sample Preparation for Microscopy =====
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[TEM Sample Preparation Equipment | TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill]]
===== Scanning Electron & Ion Microscopes =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe]]
* [[Nova 200 NanoLab: SEM, EDS & WDS | Nova 200 NanoLab: SEM, EDS & WDS]]
* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM, ESEM, Lithography & Probe Station]]
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium, Neon & Gallium FIB]]