The KNI Lab at Caltech - User contributions [en]

Rapid Thermal Processor

2023-08-17T19:01:43Z

Alireza: /* Resources */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
*[https://caltech.app.box.com/file/1283386691820 Solaris 150 – Rapid Thermal Processor -Short SOP]
*[https://caltech.app.box.com/file/1270821163104 Solaris 150 – Rapid Thermal Processor -Long SOP]

===== Manuals =====
*[https://caltech.app.box.com/file/1237887943601 Solaris 150 - Rapid Thermal Processor Manual]

Rapid Thermal Processor

2023-08-01T00:43:11Z

Alireza: /* Manuals */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* SHORT [https://caltech.app.box.com/file/1270820147602]
* LONG [https://caltech.app.box.com/file/1270821163104]

===== Manuals =====
* Solaris 150 [https://caltech.app.box.com/file/1237887943601]

Rapid Thermal Processor

2023-08-01T00:41:11Z

Alireza: /* SOPs */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* SHORT [https://caltech.app.box.com/file/1270820147602]
* LONG [https://caltech.app.box.com/file/1270821163104]

===== Manuals =====
* [https://caltech.app.box.com/file/1237887943601]

Rapid Thermal Processor

2023-08-01T00:39:14Z

Alireza: /* SOPs */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* LONG [https://caltech.app.box.com/file/1270774117557]

===== Manuals =====
* [https://caltech.app.box.com/file/1237887943601]

Rapid Thermal Processor

2023-07-31T23:54:17Z

Alireza: /* SOPs */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* [https://caltech.app.box.com/file/1270774117557]

===== Manuals =====
* [https://caltech.app.box.com/file/1237887943601]

Rapid Thermal Processor

2023-07-31T23:21:49Z

Alireza: /* Manuals */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* SOP coming soon.

===== Manuals =====
* [https://caltech.app.box.com/file/1237887943601]

Rapid Thermal Processor

2023-07-31T23:11:27Z

Alireza: /* Applications */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpeg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
===== Applications =====
*Temperature range from room temperature to 1200 degrees C.
* Processing gasses available:
**Nitrogen
**Argon
**Forming Gas (5% H2 in N2)

== Resources ==
===== SOPs =====
* SOP coming soon.

===== Manuals =====
* Manual coming soon.

Rapid Thermal Processor

2023-06-28T16:52:32Z

Alireza:

File:RTP.jpeg

2023-06-28T16:51:39Z

Alireza: Alireza uploaded a new version of File:RTP.jpeg

Rapid Thermal Processor

2023-06-28T16:48:10Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.JPG
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-28T16:40:25Z

Alireza:

Rapid Thermal Processor

2023-06-28T16:39:27Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne =
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

File:RTP.jpeg

2023-06-28T16:38:30Z

Alireza: Alireza reverted File:RTP.jpeg to an old version

File:RTP.jpeg

2023-06-28T16:37:23Z

Alireza: Alireza uploaded a new version of File:RTP.jpeg

File:RTP.jpeg

2023-06-28T16:30:51Z

Alireza:

Rapid Thermal Processor

2023-06-28T16:30:12Z

Alireza:

Rapid Thermal Processor

2023-06-28T16:16:49Z

Alireza:

Rapid Thermal Processor

2023-06-28T16:15:52Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne =
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Annealing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T17:00:35Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.JPG
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Annealing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:58:42Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne =
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Surface science integration
|Model = Solaris 150
|Techniques = Annealing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:50:21Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne =
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = Solaris 150
|Techniques = Annealing
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:47:53Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne =
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:35:41Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = RTP.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:34:39Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = Annealing.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-27T16:32:08Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = tbd.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* Rapid Thermal Processing

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Contact Mask Aligners: MA6 & MA6/BA6

2023-06-27T16:28:23Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Suss Contact Mask Aligner MA6/BA6
|HeaderColor = #FFFFFF
|ImageOne = Mask-Aligner_Suss-MicroTec-MA6-BA6.jpg
|ImageTwo = Instrument-Image.jpg
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = Alireza Ghaffari
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Suss MicroTec
|Model = MA6 & MA6/BA6
|Techniques = Frontside Alignment, Backside Alignment,Flood exposure
|EmailList = kni-photolith
|EmailListName = Photolithography
}}
== Description ==
[[Image:Mask-Aligner_Suss-MicroTec-MA6.jpg|thumb|upright=1.12|Suss MicroTec model MA6 Mask Aligner (model MA6/BA6 is shown at the top of the infobox)]]
The contact mask aligner is a tool that enables front- and back-side alignment of photo masks to create structures as small as 500 nm on sample sizes up to 6 inches. These systems are ideally suited for rapid definition of sub-micron devices through contact printing, and enable the high-resolution alignment of several lithographic layers to define complex devices. They are typically used to define contacts and connections to the nanostructures that are defined using the KNI's other fabrication instruments (e.g. e-beam lithography). The MA6/BA6 is also configured to do bond aligning in support of the Suss Microtec SB6L Wafer Bonder.
==== Suss1 MA6/BA6 Applications ====
* Front Side Flood Exposure (no mask)
* Front Side Alignment & Exposure
* Back Side Alignment with Front Side Exposure

==== Suss2 MA6 Applications ====
* Front Side Alignment & Exposure
* Back Side Alignment with Front Side Exposure

== Resources ==
=== Manufacturer Specifications ===
* Whole wafers 2” up to 6” can be loaded.
* Samples pieces up to 6”x6” square can be loaded.
* Samples up to 6mm thick can be loaded..
* Exposure Resolution:
::Soft Contact Mode = 1 - 2 um
::Hard Contact Mode = 1 um
::Soft Vacuum Contact Mode = 1 - 0.5 um
::Vacuum Contact Mode = 0.4 - 0.5 um
''' Suss 1 Exposure Settings '''
* Channel 1 is 365nm wavelength at 15 mW/cm2.
* Channel 2 is 405nm wavelength at 25 mW/cm2.
''' Suss 2 Exposure Settings '''
* Channel 1 is 365nm wavelength at 10 mW/cm2.
* Channel 2 is 405nm wavelength at 15 mW/cm2.

=== SOPs & Troubleshooting ===
* [https://caltech.box.com/s/gkhncvqe25uccym7cs5aj0n00krbmnw1 General SOP & Troubleshooting]
* [https://caltech.box.com/s/bbk4f9vi6jerhi9fcqoqa78n5npkwxkr Lamp Change SOP]
* [https://caltech.box.com/s/mj01k4mxgsxbnctv3fayzaje1ph4bfop Lamp Re-Ignition SOP]
* [https://caltech.box.com/s/xq40xbslhezrn4dyrblsgxrojd21lb8g Suss 1 Lamp Re-Ignition Video]
* [https://caltech.box.com/s/f5f4z86p8v9i43nvs7ntbgkzrog44jpm Suss 2 Lamp Re-Ignition Video]
Manufacturer Manuals
* [https://caltech.box.com/s/81h0w7viflquujpc960x76os52oinv1f Suss MA6/BA6 System Manual]
* [https://caltech.box.com/s/0bdk31f09vxui62c096lhaiguzgkc1cu Suss MA6/BA6 Brochure]
* [https://caltech.box.com/s/fxyqt4fkpb6x1c0li2l84wjose5x0wke Lamp Power Supply Manual]
* [https://caltech.box.com/s/e1b5co1cb4hwbu21ala3cnqt888tma7f Alignment Mark Suggestion Document]

==== Labrunr Reservation Rules:====
{| class="wikitable"
|-
! !! Advanced Res (days) !! Limit per Res (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 4 || 12
|-
| Weeknight || 7 || 6 || 18
|-
| Weekend || 14 || 6 || 18
|}
''' For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
'' Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''

===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Suss1 or Suss2 from the dropdown menu)

=== Optical Lithography Resources ===
* [[Optical Lithography Resources | Optical Lithography Resources Page]]
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner Cleaning SOP]
* [https://caltech.box.com/s/evjv6kciuamgl42moa8vug60dpc0gimp Laurell Spinner - Spinning Resist Video]

=== Process Recipes ===
* [https://lab.kni.caltech.edu/index.php/Process_Recipe_Library#Optical_Lithography Optical Lithography Photoresist Recipes]

== Related Instrumentation in the KNI ==
=== Optical Lithography ===
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]
=== Electron Beam Lithography ===
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
=== Ion Beam Lithography ===
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]

Contact Mask Aligners: MA6 & MA6/BA6

2023-06-27T16:28:00Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Suss Contact Mask Aligner MA6/BA6
|HeaderColor = #FFFFFF
|ImageOne = Mask-Aligner_Suss-MicroTec-MA6-BA6.jpg
|ImageTwo = Instrument-Image.jpg
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = Alireza Ghaffari
|StaffEmail = Alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Suss MicroTec
|Model = MA6 & MA6/BA6
|Techniques = Frontside Alignment, Backside Alignment,Flood exposure
|EmailList = kni-photolith
|EmailListName = Photolithography
}}
== Description ==
[[Image:Mask-Aligner_Suss-MicroTec-MA6.jpg|thumb|upright=1.12|Suss MicroTec model MA6 Mask Aligner (model MA6/BA6 is shown at the top of the infobox)]]
The contact mask aligner is a tool that enables front- and back-side alignment of photo masks to create structures as small as 500 nm on sample sizes up to 6 inches. These systems are ideally suited for rapid definition of sub-micron devices through contact printing, and enable the high-resolution alignment of several lithographic layers to define complex devices. They are typically used to define contacts and connections to the nanostructures that are defined using the KNI's other fabrication instruments (e.g. e-beam lithography). The MA6/BA6 is also configured to do bond aligning in support of the Suss Microtec SB6L Wafer Bonder.
==== Suss1 MA6/BA6 Applications ====
* Front Side Flood Exposure (no mask)
* Front Side Alignment & Exposure
* Back Side Alignment with Front Side Exposure

==== Suss2 MA6 Applications ====
* Front Side Alignment & Exposure
* Back Side Alignment with Front Side Exposure

== Resources ==
=== Manufacturer Specifications ===
* Whole wafers 2” up to 6” can be loaded.
* Samples pieces up to 6”x6” square can be loaded.
* Samples up to 6mm thick can be loaded..
* Exposure Resolution:
::Soft Contact Mode = 1 - 2 um
::Hard Contact Mode = 1 um
::Soft Vacuum Contact Mode = 1 - 0.5 um
::Vacuum Contact Mode = 0.4 - 0.5 um
''' Suss 1 Exposure Settings '''
* Channel 1 is 365nm wavelength at 15 mW/cm2.
* Channel 2 is 405nm wavelength at 25 mW/cm2.
''' Suss 2 Exposure Settings '''
* Channel 1 is 365nm wavelength at 10 mW/cm2.
* Channel 2 is 405nm wavelength at 15 mW/cm2.

=== SOPs & Troubleshooting ===
* [https://caltech.box.com/s/gkhncvqe25uccym7cs5aj0n00krbmnw1 General SOP & Troubleshooting]
* [https://caltech.box.com/s/bbk4f9vi6jerhi9fcqoqa78n5npkwxkr Lamp Change SOP]
* [https://caltech.box.com/s/mj01k4mxgsxbnctv3fayzaje1ph4bfop Lamp Re-Ignition SOP]
* [https://caltech.box.com/s/xq40xbslhezrn4dyrblsgxrojd21lb8g Suss 1 Lamp Re-Ignition Video]
* [https://caltech.box.com/s/f5f4z86p8v9i43nvs7ntbgkzrog44jpm Suss 2 Lamp Re-Ignition Video]
Manufacturer Manuals
* [https://caltech.box.com/s/81h0w7viflquujpc960x76os52oinv1f Suss MA6/BA6 System Manual]
* [https://caltech.box.com/s/0bdk31f09vxui62c096lhaiguzgkc1cu Suss MA6/BA6 Brochure]
* [https://caltech.box.com/s/fxyqt4fkpb6x1c0li2l84wjose5x0wke Lamp Power Supply Manual]
* [https://caltech.box.com/s/e1b5co1cb4hwbu21ala3cnqt888tma7f Alignment Mark Suggestion Document]

==== Labrunr Reservation Rules:====
{| class="wikitable"
|-
! !! Advanced Res (days) !! Limit per Res (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 4 || 12
|-
| Weeknight || 7 || 6 || 18
|-
| Weekend || 14 || 6 || 18
|}
''' For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
'' Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''

===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Suss1 or Suss2 from the dropdown menu)

=== Optical Lithography Resources ===
* [[Optical Lithography Resources | Optical Lithography Resources Page]]
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner Cleaning SOP]
* [https://caltech.box.com/s/evjv6kciuamgl42moa8vug60dpc0gimp Laurell Spinner - Spinning Resist Video]

=== Process Recipes ===
* [https://lab.kni.caltech.edu/index.php/Process_Recipe_Library#Optical_Lithography Optical Lithography Photoresist Recipes]

== Related Instrumentation in the KNI ==
=== Optical Lithography ===
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]
=== Electron Beam Lithography ===
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
=== Ion Beam Lithography ===
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]

File:Tbd.jpg

2023-06-27T16:17:42Z

Alireza:

Rapid Thermal Processor

2023-06-27T00:05:54Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = tbd.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==

===== Applications =====
* TBD

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Rapid Thermal Processor

2023-06-26T19:39:25Z

Alireza: /* Description */

{{InstrumentInfoboxOneImage|
|InstrumentName = Solaris Rapid Thermal Processor
|HeaderColor = #F5A81C
|ImageOne = tbd.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|StaffEmail = alireza@caltech.edu
|StaffPhone = 626-395-3984
|Manufacturer = Solaris
|Model = TBD
|Techniques = TBD
|RequestTraining = alireza@caltech.edu
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
The Solaris 150 is a manually loaded Rapid Thermal Processing System. Capable of processing silicon, III-V and other substrates up to 150mm diameter. The Solaris 150 is equipped with recipe management, system diagnostics, and user-friendly interface for operator productivity. Suitable for all Clean Room environments. The system can be configured for compound semiconductor use.

===== Applications =====
* TBD

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]

Light Microscope with Spectroscopic Reflectometer

2022-06-06T23:46:58Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Light Microscope with Reflectometry
|HeaderColor = #F5A81C
|ImageOne = Olympus-BX51M-with-Filmetrics-F40.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Optical Characterization|Optical Characterization]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = [[Bert Mendoza]]
|StaffEmail = bertm@caltech.edu
|StaffPhone = 626-395-4075
|Manufacturer = Olympus / Filmetrics
|Model = BX51M / F40
|Techniques = Optical Microscopy, Spectroscopic Reflectometry
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
This light microscope (Olympus BX51M) can be used to observe patterns and samples optically via 5x, 10x, 50x and 100x objective lenses. It also is equipped with a spectroscopic reflectometer (Filmetrics model F40) that can measure the thickness of transparent and translucent thin films. Spectroscopic reflectometry works by comparing the spectral amplitude and periodicity of light that is reflected at normal incidence from a thin film against the light that is reflected from a known reference sample; the results are fit to a mathematical model that takes into account estimated values for ''n'' (refractive index), ''k'' (absorption coefficient), and thickness.

===== Applications =====
* Optical imaging
* Thickness determinations

== Resources ==
===== SOP =====
* [https://caltech.app.box.com/file/967699756432 KNI SOP]

===== Manufacturer Manuals =====
* [https://caltech.app.box.com/file/967699704785 Microscope Manual]
* [https://caltech.app.box.com/file/953578875131?s=2gqm0ucq8t5rjkzixg0x0y4bo0d643pf Filmetrics Manual]

== Specifications ==
* Objective Lenses: 5x, 10x, 50x, 100x
* Optical Image Modes: Bright Field, Dark Field
* Thickness Range: 20 nm to 40 μm
* Wavelength Range: 400 to 850 nm

Light Microscope with Spectroscopic Reflectometer

2022-06-06T23:43:06Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Light Microscope with Reflectometry
|HeaderColor = #F5A81C
|ImageOne = Olympus-BX51M-with-Filmetrics-F40.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Optical Characterization|Optical Characterization]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = [[Bert Mendoza]]
|StaffEmail = bertm@caltech.edu
|StaffPhone = 626-395-4075
|Manufacturer = Olympus / Filmetrics
|Model = BX51M / F40
|Techniques = Optical Microscopy, Spectroscopic Reflectometry
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
This light microscope (Olympus BX51M) can be used to observe patterns and samples optically via 5x, 10x, 50x and 100x objective lenses. It also is equipped with a spectroscopic reflectometer (Filmetrics model F40) that can measure the thickness of transparent and translucent thin films. Spectroscopic reflectometry works by comparing the spectral amplitude and periodicity of light that is reflected at normal incidence from a thin film against the light that is reflected from a known reference sample; the results are fit to a mathematical model that takes into account estimated values for ''n'' (refractive index), ''k'' (absorption coefficient), and thickness.

===== Applications =====
* Optical imaging
* Thickness determinations

== Resources ==
===== SOP =====
* [https://caltech.app.box.com/file/967699756432 KNI SOP]

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/BROKEN Microscope Manual (Coming Soon)]
* [https://caltech.app.box.com/file/953578875131?s=2gqm0ucq8t5rjkzixg0x0y4bo0d643pf Filmetrics Manual]

== Specifications ==
* Objective Lenses: 5x, 10x, 50x, 100x
* Optical Image Modes: Bright Field, Dark Field
* Thickness Range: 20 nm to 40 μm
* Wavelength Range: 400 to 850 nm

Light Microscope with Spectroscopic Reflectometer

2022-06-06T23:41:14Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Light Microscope with Reflectometry
|HeaderColor = #F5A81C
|ImageOne = Olympus-BX51M-with-Filmetrics-F40.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Optical Characterization|Optical Characterization]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = [[Bert Mendoza]]
|StaffEmail = bertm@caltech.edu
|StaffPhone = 626-395-4075
|Manufacturer = Olympus / Filmetrics
|Model = BX51M / F40
|Techniques = Optical Microscopy, Spectroscopic Reflectometry
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
This light microscope (Olympus BX51M) can be used to observe patterns and samples optically via 5x, 10x, 50x and 100x objective lenses. It also is equipped with a spectroscopic reflectometer (Filmetrics model F40) that can measure the thickness of transparent and translucent thin films. Spectroscopic reflectometry works by comparing the spectral amplitude and periodicity of light that is reflected at normal incidence from a thin film against the light that is reflected from a known reference sample; the results are fit to a mathematical model that takes into account estimated values for ''n'' (refractive index), ''k'' (absorption coefficient), and thickness.

===== Applications =====
* Optical imaging
* Thickness determinations

== Resources ==
===== SOP =====
* [https://caltech.app.box.com/file/967699756432 KNI SOP (Coming Soon)]

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/BROKEN Microscope Manual (Coming Soon)]
* [https://caltech.app.box.com/file/953578875131?s=2gqm0ucq8t5rjkzixg0x0y4bo0d643pf Filmetrics Manual (Coming Soon)]

== Specifications ==
* Objective Lenses: 5x, 10x, 50x, 100x
* Optical Image Modes: Bright Field, Dark Field
* Thickness Range: 20 nm to 40 μm
* Wavelength Range: 400 to 850 nm

Light Microscope with Spectroscopic Reflectometer

2022-06-06T23:35:58Z

Alireza:

{{InstrumentInfoboxOneImage|
|InstrumentName = Light Microscope with Reflectometry
|HeaderColor = #F5A81C
|ImageOne = Olympus-BX51M-with-Filmetrics-F40.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Optical Characterization|Optical Characterization]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-1535
|PrimaryStaff = [[Bert Mendoza]]
|StaffEmail = bertm@caltech.edu
|StaffPhone = 626-395-4075
|Manufacturer = Olympus / Filmetrics
|Model = BX51M / F40
|Techniques = Optical Microscopy, Spectroscopic Reflectometry
|EmailList = kni-metrology
|EmailListName = Metrology
}}
== Description ==
This light microscope (Olympus BX51M) can be used to observe patterns and samples optically via 5x, 10x, 50x and 100x objective lenses. It also is equipped with a spectroscopic reflectometer (Filmetrics model F40) that can measure the thickness of transparent and translucent thin films. Spectroscopic reflectometry works by comparing the spectral amplitude and periodicity of light that is reflected at normal incidence from a thin film against the light that is reflected from a known reference sample; the results are fit to a mathematical model that takes into account estimated values for ''n'' (refractive index), ''k'' (absorption coefficient), and thickness.

===== Applications =====
* Optical imaging
* Thickness determinations

== Resources ==
===== SOP =====
* [https://caltech.box.com/s/BROKEN KNI SOP (Coming Soon)]

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/BROKEN Microscope Manual (Coming Soon)]
* [https://caltech.app.box.com/file/953578875131?s=2gqm0ucq8t5rjkzixg0x0y4bo0d643pf Filmetrics Manual (Coming Soon)]

== Specifications ==
* Objective Lenses: 5x, 10x, 50x, 100x
* Optical Image Modes: Bright Field, Dark Field
* Thickness Range: 20 nm to 40 μm
* Wavelength Range: 400 to 850 nm